Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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|Acetone | |Acetone | ||
| | | | ||
[[media:Process_Flow_AZ5214E_pos_vers2.docx |Process_Flow_AZ5214_pos.docx]] | |||
[[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx]] | |||
|- | |- | ||
| Line 54: | Line 54: | ||
|[[media:AZ4500.pdf|AZ4500.pdf]] | |[[media:AZ4500.pdf|AZ4500.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | ||
|... | |28 mJ/cm2 per µm resist for i-line, possibly increasing for increasing thickness. | ||
Multiple exposure recommended. | |||
1/2 dose for broadband exposure. | |||
|AZ 351B developer | |AZ 351B developer | ||
|DI water | |DI water | ||
| Line 70: | Line 74: | ||
|Preliminary results: | |Preliminary results: | ||
105 mJ/cm2 per µm resist for i-line | 105 mJ/cm2 per µm resist for i-line. | ||
1/5 dose for broadband exposure | 1/5 dose for broadband exposure. | ||
|AZ 726 MIF developer | |AZ 726 MIF developer | ||
|DI water | |DI water | ||
| Line 105: | Line 109: | ||
|[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | |[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | ||
|Thickness and process dependent | |Thickness and process dependent. | ||
|PGMEA, mr-Dev 600 developer | |PGMEA, mr-Dev 600 developer | ||
|IPA | |IPA | ||