Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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===[[Specific Process Knowledge/Lithography/LiftOff|Lift-off]]=== | ===[[Specific Process Knowledge/Lithography/LiftOff|Lift-off]]=== | ||
*[[Specific Process Knowledge/Lithography/LiftOff#Lift-off wet bench|Lift-off wet bench]] | *[[Specific Process Knowledge/Lithography/LiftOff#Lift-off wet bench|Lift-off wet bench]] | ||
*[[Specific Process Knowledge/Lithography/LiftOff# | *[[Specific Process Knowledge/Lithography/LiftOff#Lift-off (4", 6")|Lift-off (4", 6")]] | ||
===[[Specific Process Knowledge/Lithography/WaferCleaning|Wafer Cleaning]]=== | ===[[Specific Process Knowledge/Lithography/WaferCleaning|Wafer Cleaning]]=== | ||
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