2nd Level - Process Topic
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Overview of sample processing 3
Clean your sample Clean your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Wafer cleaning
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Soap Sonic
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Removes dust and particles
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7-up & Piranha
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Removes organics and alkali ions
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RCA
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Two step process to remove organics and metals
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5% HF
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Removes native oxide
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IMEC
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Removing dust, organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
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| File:Create a film on your sample.pngCreate a layer/film on your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Thermal Process/Oxidation
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Thermal oxidation
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Thermal SiO2
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| Thin film deposition
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Sputter deposition
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Si,SiO2,Si3N3,TiO2, metals
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Thermal evaporation
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Al, ?
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E-beam evaporation
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Metals
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LPCVD
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Si3N4, SRN, SiO2, Si (poly and amorph)
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PECVD
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Si3N4, SiO2, PBSG
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Electroplating
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Ni
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| Lithography/Coaters
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Spin coating
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resists, polymers
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Spray coating
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resists, polymers
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| Epitaxial growth
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MOCVD
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?
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| File:Transfer mask pattrn to your sample.pngTransfer mask pattern to your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Etch
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Wet etch
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Si,Glass,SiO2,Si3N4,Al,Cr,Ti,Au,Pt,InP,InGaAsP,GaAs/AlGaAs
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Dry etch
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Any material
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| Lift-off
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?
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Define your structure directly to your sample
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| Imprinting
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| LASER machining
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| Lithographic definition
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| Polymer Injection molding
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