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Showing below up to 50 results in range #351 to #400.

351. Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD (16:19, 16 June 2025)
352. Specific Process Knowledge/Etch/ICP Metal Etcher/Examples of End point detection (16:19, 16 June 2025)
353. Specific Process Knowledge/Etch/ICP Metal Etcher/Barc Etch (16:19, 16 June 2025)
354. Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Remove resist in the AOE (16:20, 16 June 2025)
355. Specific Process Knowledge/Etch/ICP Metal Etcher/silicon nitride (16:20, 16 June 2025)
356. Specific Process Knowledge/Characterization/EDX (16:20, 16 June 2025)
357. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD/PECVD3: Low stress nitride testing (16:20, 16 June 2025)
358. Specific Process Knowledge/Etch/III-V RIE/III V RIE ETCHES/Details SiO2 100 (16:21, 16 June 2025)
359. Specific Process Knowledge/Etch/III-V ICP (16:22, 16 June 2025)
360. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2 (16:22, 16 June 2025)
361. Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch) (16:22, 16 June 2025)
362. Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch) (16:31, 16 June 2025)
363. Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/CF4 recipes for SiO2 (16:34, 16 June 2025)
364. Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide (16:35, 16 June 2025)
365. Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher (16:39, 16 June 2025)
366. Specific Process Knowledge/Thin film deposition/Wordentec (17:29, 16 June 2025)
367. Specific Process Knowledge/Back-end processing/Polymer Injection Molder (17:37, 16 June 2025)
368. Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask (23:33, 16 June 2025)
369. LabAdviser/314/Preparation 314-307/Soft-matter (23:45, 16 June 2025)
370. Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE (23:47, 16 June 2025)
371. LabAdviser/314/Microscopy 314-307/TEM/ATEM (23:48, 16 June 2025)
372. Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL (23:50, 16 June 2025)
373. LabAdviser/314/Microscopy 314-307/SEM/Nova/Transmission Kikuchi diffraction (11:49, 17 June 2025)
374. LabAdviser/Technology Research/Nanoscale characterization of ultra-thin metal films for nanofabrication applications (11:59, 17 June 2025)
375. Specific Process Knowledge/Thin film deposition/Deposition of Gold/Adhesion layers (12:00, 17 June 2025)
376. Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Notes on low oxygen content in e-beam prepared Al thin films (14:13, 17 June 2025)
377. LabAdviser/Process Flow/Solar cell process flow (14:26, 17 June 2025)
378. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide (14:35, 17 June 2025)
379. Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD (14:36, 17 June 2025)
380. Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride (14:41, 17 June 2025)
381. Specific Process Knowledge (16:26, 17 June 2025)
382. LabAdviser/Courses (16:45, 17 June 2025)
383. Specific Process Knowledge/Back-end processing/Polishing machine (17:54, 17 June 2025)
384. Specific Process Knowledge/Overview of Fume Hoods (22:18, 17 June 2025)
385. Specific Process Knowledge/Cleanroom Chemicals (22:19, 17 June 2025)
386. Specific Process Knowledge/Cross Contamination (22:36, 17 June 2025)
387. Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Aluminium deposition on ZEP520A for lift-off (07:10, 18 June 2025)
388. Specific Process Knowledge/Thin film deposition/Deposition of Aluminium (07:14, 18 June 2025)
389. Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Thermal deposition of Al (11:54, 18 June 2025)
390. Specific Process Knowledge/Thin film deposition/thermalevaporator (12:01, 18 June 2025)
391. Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride/Deposition of Titanium Nitride using Lesker sputter tool (09:33, 19 June 2025)
392. Specific Process Knowledge/Thermal Process/C2 Furnace General Purpose Annealing (14:56, 19 June 2025)
393. Specific Process Knowledge/Thin film deposition/Lesker/Stress dependence on sputter parameters in the Lesker sputter system (12:33, 20 June 2025)
394. Specific Process Knowledge/Thin film deposition/Deposition of Copper (14:57, 20 June 2025)
395. Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films (15:31, 20 June 2025)
396. Specific Process Knowledge/Characterization (16:09, 20 June 2025)
397. Specific Process Knowledge/Etch/RIE (Reactive Ion Etch) (16:24, 20 June 2025)
398. Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Sputtering of Cr in Wordentec (16:35, 20 June 2025)
399. Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300 (16:43, 20 June 2025)
400. Specific Process Knowledge/Thin film deposition/Electroplating-Ni (16:57, 20 June 2025)