Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD
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| Recipe | Dep. rate [nm/min] | RI | Unif. [%] | Stress [MPa] | Comments | SiH4 [sccm] | N2 [sccm] | B2H6 | PH3 | Pressure [mTorr] | Power [W] | Load | Tune | Time [mm:ss] | Tested
|
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| aSi_1 | ~6 nm/min | ? | ? | ? | 100 | 0 | 200 mTorr | 10HF | From logbook June 2019 |