Specific Process Knowledge/Lithography

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Available lithography methods at Danchip

There are a broad varity of lithography methods at Danchip. The methods are compared here to make it easier for you to compare and choose the one that suits your needs.

• Process description using method 1

• Process description using method 2

Comparing lithography methods at Danchip

	UV Lithography	DUV Stepper Lithography	E-beam Lithography	Nano Imprint Lithography	2-Photon Polymerization Lithography
Generel description	Generel description - method 1	Generel description - method 2	The JEOL JBX-9500 electron beam lithography system is designed for writing patterns with dimensions from nanometers to sub-micrometers. The minimum electron beam spot size is around 12 nm, the maximum writing-field without stitching is 1 mm x 1 mm.	4	5
Pattern size range	~1µm and up	~200nm and up	~10nm and up	~20nm and up	3D: 0.3 µm spot; 1.3 µm high
Resist type	UV sensitive: AZ SU-8	DUV sensitive KSF M230Y KSF M35G	E-beam sensitive ZEP502A (positive) HSQ (negative) SU-8	Imprint polymers: ??	UV cross-linking: IP photoresists SU-8
Resist thickness range	~0.5µm to 20µm?	~50nm to 2µm?	~30nm to 0.5 µm	~20nm to 10µm?	?nm - ?µm
Typical exposure time	2s-30s pr. wafer	?-? pr. ?	Depends on dose, Q [µC/cm2], beam current, I [A], and pattern area, A [cm2]: t = Q*A/I	? pr. wafer	? pr. µm2
Substrate size	small samples 50 mm wafers 100 mm wafers 150 mm wafers	100 mm wafers 150 mm wafers 200 mm wafers	We have cassettes that fit to 4 small samples (20mm, 12mm, 8mm, 4mm) 6 wafers of 50 mm in size 2 wafers of 100 mm in size 1 wafer of 150 mm in size Only one cassette can be loaded at time	small samples 50 mm wafers 100 mm wafers 150 mm wafers	Cover slides 50 mm wafers 100 mm wafers IBIDI
Allowed materials	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2 Allowed material 3	Si, SiO2, III-V materials	Allowed material 1 Allowed material 2 Allowed material 3	Allowed material 1 Allowed material 2 Allowed material 3

Equipment Pages

UV Lithography Pretreatment HMDS BHF 250C Oven for Pretreatment Coaters SSE Spinner Spin Track 1 + 2 KS Spinner Manual Spinner (Polymers) Manual Spinner 1 (Laurell) Spray Coater (Sono-tek ExactaCoat) UV Exposure KS Aligner EVG Aligner III-V Aligner Inclined UV lamp Baking Hotplates Ovens Development Strip Plasma Asher 1 Plasma Asher 2 III-V Plasma Asher Rough Acetone Strip Fine Acetone Strip Lift-off Lift-off Wet Bench Lift-off (4", 6") Wafer Cleaning Spin dryers

DUV Stepper Lithography Gamma Spinner DUV Stepper E-Beam Lithography E-beam Spinner E-Beam Development NanoImprint Lithography Molecular Vapour Deposition Obducat NIL EVG NIL 3D Lithography 2-Photon Polymerization