Specific Process Knowledge/Lithography: Difference between revisions
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'''<big><div class="center">Coating methods | '''<big><div class="center">Coating methods</div></big>''' | ||
'''[[Specific Process Knowledge/Lithography/Coaters| | '''[[Specific Process Knowledge/Lithography/Coaters|Automatic spin coating]]''' | ||
*[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]] | *[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]] | ||
*[[Specific Process Knowledge/Lithography/DUVStepperLithography#SÜSS Spinner-Stepper|Spin Coater: Süss Stepper]] | *[[Specific Process Knowledge/Lithography/DUVStepperLithography#SÜSS Spinner-Stepper|Spin Coater: Süss Stepper]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] | *[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] | ||
'''[[Specific Process Knowledge/Lithography/Coaters|Manual spin coating]]''' | |||
*[[Specific Process Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | *[[Specific Process Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: Labspin 02/03]] | *[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: Labspin 02/03]] | ||
'''[[Specific Process Knowledge/Lithography/Coaters|Spray coating]]''' | |||
*[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]] | *[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]] | ||
'''[[Specific Process Knowledge/Lithography/Baking| | '''[[Specific Process Knowledge/Lithography/Baking|Soft & hard baking]]''' | ||
*[[Specific Process Knowledge/Lithography/Baking#Hotplates|Hotplates]] | *[[Specific Process Knowledge/Lithography/Baking#Hotplates|Hotplates]] | ||
*[[Specific Process Knowledge/Lithography/Baking#Ovens|Ovens]] | *[[Specific Process Knowledge/Lithography/Baking#Ovens|Ovens]] | ||
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'''<big><div class="center"> | '''<big><div class="center">Design transfer methods</div></big>''' | ||
'''[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure Tools]]''' | '''[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure Tools]]''' | ||
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'''<big><div class="center">Development methods</div></big>''' | '''<big><div class="center">Development methods</div></big>''' | ||
'''[[Specific Process Knowledge/Lithography/Development| | '''[[Specific Process Knowledge/Lithography/Development|Manual development]]''' | ||
*[[Specific_Process_Knowledge/Lithography/Development#Manual_beaker_development_in_fumehood|Manual beaker development]] | *[[Specific_Process_Knowledge/Lithography/Development#Manual_beaker_development_in_fumehood|Manual beaker development]] | ||
'''[[Specific Process Knowledge/Lithography/Development|SU-8 development]]''' | |||
*[[Specific_Process_Knowledge/Lithography/Development#Developer:_SU8_(Wet_Bench)|Developer: SU8 (Wetbench)]] | *[[Specific_Process_Knowledge/Lithography/Development#Developer:_SU8_(Wet_Bench)|Developer: SU8 (Wetbench)]] | ||
'''[[Specific Process Knowledge/Lithography/Development|Semi-automatic puddle development]]''' | |||
*[[Specific_Process_Knowledge/Lithography/Development#Developer:_E-beam_02|Developer: E-beam 02]] | *[[Specific_Process_Knowledge/Lithography/Development#Developer:_E-beam_02|Developer: E-beam 02]] | ||
*[[Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual_02|Developer: TMAH Manual 02]] | *[[Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual_02|Developer: TMAH Manual 02]] | ||
'''[[Specific Process Knowledge/Lithography/Development|Automatic puddle development]]''' | |||
*[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|Developer: TMAH UV-lithography]] | *[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|Developer: TMAH UV-lithography]] | ||
*[[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer:_TMAH_Stepper|Developer: TMAH Stepper]] | *[[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer:_TMAH_Stepper|Developer: TMAH Stepper]] | ||