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Specific Process Knowledge/Lithography/Strip: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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'''Typical stripping parameters'''
'''Typical stripping parameters'''
*Tested with resist: 1.5 µm AZ 5214E
Tested with 1.5 µm AZ 5214E on 100 mm silicon substrate.
*Tested with substrate: 100 mm Si
*O<sub>2</sub>: 100 sccm
*O<sub>2</sub>: 100 sccm
*N<sub>2</sub>: 100 sccm
*N<sub>2</sub>: 100 sccm
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