Specific Process Knowledge/Lithography/Strip: Difference between revisions
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==Process temperature for plasma asher 4 & 5== | ==Process temperature for plasma asher 4 & 5== | ||
[[File:PA_temperature_v2.png|320px|thumb|Ashing rate as function of temperature.|right]] | [[File:PA_temperature_v2.png|320px|thumb|Ashing rate as function of temperature.|right]] | ||
The ashing rate is related to the temperature during processing. Higher temperature | The ashing rate is related to the temperature during processing. Higher temperature increases ashing rate. | ||
'''Single substrate:'''<br> | '''Single substrate:'''<br> | ||