Jump to content

Specific Process Knowledge/Lithography/Strip: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Line 164: Line 164:
!Process gases
!Process gases
|
|
*O<sub>2</sub> (140 sccm)
*O<sub>2</sub> (100 sccm)
*N<sub>2</sub> (60 sccm)
*N<sub>2</sub> (100 sccm)
|
|
*O<sub>2</sub> (70-210 sccm)
*O<sub>2</sub> (70-210 sccm)
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Strip"