Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

Terminal window after compilation. The first line changes working directory, second line calls compilation. Image: Thomas Pedersen.

'''ACHK''' shows how patterns are placed on the substrate. It will however only show the bounding box of the pattern. In this case the pattern is very small compared to the 4" wafer and thus one has to zoom into the center to see the 10 instances of the design. Image: Thomas Pedersen.

Use Shot shape display to verify that the pattern and beam pitch/overlap looks as intended. Image: Thomas Pedersen.

Operation screen of the automatic cassette transfer system / auto stocker. Photo: Thomas Pedersen.

Samples can be loaded into appropriate cassettes on the cassette preparation table. Photo: Thomas Pedersen.

'''Calibration''' and '''RESTOR''' windows. Image: Thomas Pedersen.

Result display of current measurement. Image: Thomas Pedersen.

Correct result of '''INITAE''' (left) and '''INITBE''' (right). Image: Thomas Pedersen.

Load the '''daily''' batch command and execute it. Image: Thomas Pedersen.

Comparison of two drift measurements. Image: Thomas Pedersen.

Parameters of the '''HEIMAP''' subprogram used for the tutorial exposure. Image: Thomas Pedersen.

Acquire the calibration data and then apply the data to save. Image: Thomas Pedersen.

'''Expose''' window with .mgn file loaded for exposure. Notice that the '''Progress''' part of the window still shows the previous exposure information. This field will not update until exposure is started. Image: Thomas Pedersen.

Use the '''Pattern writing execution check''' window to verify the cassette number and estimated execution time. Image: Thomas Pedersen.

Developer: E-beam is a semi-automatic puddle developer with AR 600-546 and ZED N50 developers. Image: Thomas Pedersen.

Result of the tutorial job after development. Image: Thomas Pedersen.