Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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Revision as of 08:50, 28 February 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Pattern preparation ← Older edit		Revision as of 08:52, 28 February 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Pattern preparation Newer edit →
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	Each node has several options and these can be changed by double clicking the node. For the export node we will need to choose the correct machine in "Machine Type", the DTU Nanolab system is "JBX-9500FS (100kV)". On the advanced tab we will choose "Floating" field ordering and "Center to Field". This will ensure that our features/pattern will be written in the center of the writing field. The setup will look like the parameters below.		Each node has several options and these can be changed by double clicking the node. For the export node we will need to choose the correct machine in '''Machine Type''', the DTU Nanolab system is a '''JBX-9500FS (100kV)'''. On the advanced tab we will choose '''Floating''' field ordering and '''Center to Field''''. This will ensure that our features/pattern will be written in the center of the writing field. The setup will look like the parameters below.

	{\| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"		{\| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"