Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,224 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,224 edits
Line 114: Line 114:
|-  
|-  
| colspan="1" style="text-align:center;|
| colspan="1" style="text-align:center;|
2", 4" and 6" substrates can be coated with AR-P6200.09 (CSAR) on Spin Coater: Gamma E-beam & UV. Photo: Thomas Pedersen.
2", 4" and 6" substrates can be coated with AR-P6200.09 (CSAR) on [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_E-beam_and_UV_processing|Spin Coater: Gamma E-beam & UV]]. Photo: Thomas Pedersen.
|}
|}


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/FirstEBL"