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{{:Specific Process Knowledge/Lithography/Coaters/labspin}}
{{:Specific Process Knowledge/Lithography/Coaters/labspin}}
== Manual Spin Coaters ==
''Go back to [[Specific_Process_Knowledge/Lithography/Coaters#Coater_Comparison_Table|Coater comparison table]]''.
{| cellpadding="2" style="border: 2px solid darkgray;" align="right"
! width="350" |
! width="350" |
! width="350" |
|- border="0" align="center"
|[[Image:Labspin_2.JPG|300px]]
|[[Image:Labspin_3_+_fumehood_11.JPG|300px]]
|[[Image:IMG 1175.JPG|300px]]
|- align="center"
| '''Spin Coater: Labspin 02''' ||  '''Spin Coater: Labspin 03 + fumehood 11''' || '''Spin Coater: Manual All Purpose (Decommissioned)'''
|- align="center"
| Loacted in wetbench 08 in E-5 ||  Located in wetbench 09 in E-5|| Located in fumehood in C-1
|- align="center"
| LabSpin 6, Süss MicroTec || LabSpin 6, Süss MicroTec || WS-650, Laurell
|- align="center"
| '''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=362 LabManager]''' || '''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=387 LabManager]'''  || '''[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=315 LabManager]'''
|}
'''Training video: [https://www.youtube.com/watch?v=_neUkDsQhsM LabSpin02 + 03]'''
===Process information===
Spin curves (LabSpin 6): [[media:AZ5214E_spin_curve.pdf‎|AZ 5214E‎]], [[media:Spin_curve_nLoF2020.pdf‎|AZ nLOF 2020]], [[media:Spin_curve_ZEP520A.pdf‎|ZEP 520A‎]], [[media:Spin_curve_Fox-15.pdf|FOX-15]], [[media:AZ_4562_spin_curve.pdf|AZ 4562‎]], [[Specific_Process_Knowledge/Lithography/CSAR#Spin_Curves|CSAR 6200]], [[media:AZ MiR 701 spin curve.pdf|AZ MiR 701]].
More information on resists (incl. spin curves) is available in the [[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|Resist Overview]].
'''This table is under construction''' [[Image:section under construction.jpg|70px]]
'''Available bowlsets:'''
{|border="1" cellspacing="1" cellpadding="7" style="text-align:center;"
|-
|-
|-style="background:silver; color:black"
|
!Component solvent
!Cleaning solvent
!List of resists
!Comments
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ resist
|PGMEA/Ethyl Lactate
|Acetone
|AZ 5214E, AZ 4562, AZ MiR 701, AZ nLOF 2000 series,
mr-I8100R?
|Two sets available
|-
|-
|-style="background:LightGrey; color:black"
!CSAR/ZEP/mrEBL/PMMA
|Anisole
|Remover 1165
|AR-P 6200 series (CSAR 62), ZEP520A, mr EBL 6000, PMMA (in anisole),
UV5?, mr-T85L?, XNIL26?, mri8000?, mr-I 7010E?, mr-XNIL26_SF?, mrNIL210?
|
|-
|-
|-style="background:WhiteSmoke; color:black"
!HSQ/AR-N 8200
|MIBK/PGMEA
|Acetone
|HSQ (FOx series), AR-N 8200
|
|-
|-
|-style="background:LightGrey; color:black"
!OrmoComp/OrmoStamp
|Propyl Acetate
|Acetone
|OrmoComp, OrmoStamp, OrmoPrime, OrmoClad?
Inkron?, mr-I-7030R?, mr-I 8020E?, mr-I-7010E?, mrNIL210?, mr-I 8500E?, mr-T85?, MRT HI01XP?, Protek B3?, mrUVCur21?, mr-I 8100E_XP?, mrNIL210?, MRT HI01XP?, mr-NIL 6000.3E?, mr-I 8100R_XP?
|
|-
|-
|-style="background:WhiteSmoke; color:black"
!BCB/CYCLOTENE
|Mesitylene
|T1100
|3022-X, 4022-X
|
|-
|-
|-style="background:LightGrey; color:black"
!Epoxy/Acrylate
|Cyclopentanone/PGMEA
|Acetone
|SU-8 2000 series, mr-DWL, LOR (1A, 3A, 5A)
mr-i 8030e?, mr-NIL200?, DELO-PRE/OM4310?, OrmoStamp?, Inkron?, mr-I 8020E?, OM4310?
|
|-
|-
|-style="background:WhiteSmoke; color:black"
!AR-P 617/AR-N 7520
|PGME/PGMEA
|Acetone
|AR-N 7500 series
|
|-
|-
|-style="background:LightGrey; color:black"
!Polymer Ps-b-PDMS/block copolymer
|Heptane
|Ethyl Acetate
|
|
|-
|-
|-style="background:WhiteSmoke; color:black"
!DIRTY bowlset
|Anything Organic
|Use the appropriate cleaning reagent for your resist
|
|
|-
|}
<br clear="all" />
=== Equipment performance and process related parameters ===
{| border="2" cellspacing="0" cellpadding="2"
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose
|style="background:LightGrey; color:black"|Labspin
|style="background:WhiteSmoke; color:black" align="center"|
Spin coating of resist ONLY in dedicated bowlsets
Please do NOT use substances which is not for the dedicated bowlsets
|-
|style="background:LightGrey; color:black"|All purpose
|style="background:WhiteSmoke; color:black" align="center"|
Spin coating of dirty substances in '''All purpose'''
<br>
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters
|style="background:LightGrey; color:black"|Spin speed
|style="background:WhiteSmoke; color:black" align="center"|
*Vacuum chuck: 100 - 5000 rpm <br>
*Edge handling chuck: Max. 3000 rpm
|-
|style="background:LightGrey; color:black"|Spin acceleration
|style="background:WhiteSmoke; color:black" align="center"|
*200 - 4000 rpm/s <br>
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black" |Substrate size
|style="background:WhiteSmoke; color:black" align="center"|
*Chips 5x5 mm and up
*50 mm wafers
*100 mm wafers
*150 mm wafers
|-
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black" align="center"|
All cleanroom materials
'''Please ONLY use substances which is for the dedicated bowlsets in labspins'''
|-
|style="background:LightGrey; color:black"|Batch
|style="background:WhiteSmoke; color:black" align="center"|
1
|-
|}
<br clear="all" />


=Spray Coater=
=Spray Coater=
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Coaters"