Specific Process Knowledge/Lithography/Strip: Difference between revisions
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At a load at 2 Fused silica wafers resist removed 0.01-01,5 um | At a load at 2 Fused silica wafers resist removed 0.01-01,5 um | ||
==Plasma asher== | ==Plasma asher 1== | ||
[[Image:plasmaasher2.JPG|300x300px|thumb|The Plasma Asher 1 is placed in C-1]] | [[Image:plasmaasher2.JPG|300x300px|thumb|The Plasma Asher 1 is placed in C-1]] | ||