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Specific Process Knowledge/Lithography: Difference between revisions
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← Older edit
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Revision as of 11:54, 24 November 2020
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Taran
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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Knowledge and Information about Lithography
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Revision as of 11:33, 7 December 2020
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Lgpe
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DCH-Employees-701, NLAB-Employees-701
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Comparing lithography methods at DTU Nanolab
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Line 50:
Line 50:
*~200 nm and up
*~200 nm and up
|
|
*~12 nm - 1 µm
*~12 nm - 1 µm
(and larger at high currents)
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|
*~20 nm and up
*~20 nm and up
