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Specific Process Knowledge/Lithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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*E-beam sensitive
*E-beam sensitive
**AR-P6200 CSAR, ZEP502A , PMMA, HSQ, mr-EBL, AR-N 7520
**AR-P6200 CSAR, ZEP502A , PMMA (positive)
**HSQ, mr-EBL, AR-N 7520 (negative)
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*Imprint polymers:
*Imprint polymers:
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