Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
No edit summary |
|||
| Line 24: | Line 24: | ||
== Process information on PECVD3 and PECVD4== | == Process information on PECVD3 and PECVD4== | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD|Recipes for deposition of silicon oxides]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD|Recipes for deposition of silicon oxides]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD|Recipes on for deposition of silicon nitride and silicon oxynitride]] | ||
*[[/Doping|Doping with boron]] | *[[/Doping|Doping with boron]] | ||
*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | *[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | ||