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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,311 edits
Line 54: Line 54:
|10<!-- SiH4 [sccm] -->
|10<!-- SiH4 [sccm] -->
|1420<!-- N2O [sccm] -->
|1420<!-- N2O [sccm] -->
|<!-- N2 [sccm] -->
|392<!-- N2 [sccm] -->
|<!-- B2H6 -->
|<!-- B2H6 -->
|<!-- PH3 -->
|<!-- PH3 -->
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