Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD/LF SiO2 results

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LF SiO2 results from PECVD4

Uniformity results using the carrier 7 x 2" wafers

Experiment was made by Jesper Fly Hansen @ NILT in June 2018
The recipe LF_SiO2 was run for 13 seconds. This gave the following thicknesses on the 7 2" wafers on the carrier made for 7 2" wafers.