Specific Process Knowledge: Difference between revisions

From LabAdviser
Bghe (talk | contribs)
Bghe (talk | contribs)
Line 432: Line 432:
|
|
|Sputter deposition
|Sputter deposition
|Si,SiO2,Si3N3,TiO2, metals
|Metals: Ti, Cu, Al, Cr, Ag, Au, Pd, Ta, Cu, Ta, W, Mo, Co, Fe, Pt, Mg, Nb, Ni, Ru <br>
Semiconductors: Si, Ge <br>
Oxides: SiO2, ITO, ZnO, Al2O3, Cr2O3, MgO, Ta2O3 <br>
Alloys: NiV, MnIr, NiFe, AlCu, CoFe, CuTi, FeMn, NiCo <br>
|-
|-
|
|

Revision as of 09:21, 20 October 2014

2nd Level - Process Topic

Feedback to this page: click here


Choose the process topic you are interested in

The section below here is under construction

Overview of sample processing

Clean your sample Dry your sample Create a thin film on your sample Dope your sample
Thermal treatment of your sample Make a mask on your sample Transfer pattern to your sample Define your structure directly
Bond your samples together Characterize your sample Pack your sample  



jmli test