Specific Process Knowledge: Difference between revisions
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|Sputter deposition | |Sputter deposition | ||
|Si,SiO2, | |Metals: Ti, Cu, Al, Cr, Ag, Au, Pd, Ta, Cu, Ta, W, Mo, Co, Fe, Pt, Mg, Nb, Ni, Ru <br> | ||
Semiconductors: Si, Ge <br> | |||
Oxides: SiO2, ITO, ZnO, Al2O3, Cr2O3, MgO, Ta2O3 <br> | |||
Alloys: NiV, MnIr, NiFe, AlCu, CoFe, CuTi, FeMn, NiCo <br> | |||
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