Specific Process Knowledge: Difference between revisions
| Line 537: | Line 537: | ||
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|Photolithography | |Photolithography | ||
|UV resists | |||
|- | |- | ||
| | | | ||
|Deep UV lithography | |Deep UV lithography | ||
|DUV resists | |||
|- | |- | ||
| | | | ||
|E-beam lithography | |E-beam lithography | ||
|E-beam resists | |||
|- | |- | ||
| | | | ||
|Imprinting | |Imprinting | ||
|Polymers | |||
|- | |- | ||
| | |||
|Lift-off | |||
|mostly used for making metal masks | |||
|} | |} | ||
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="430px" | {| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2" align="left" width="430px" | ||