Specific Process Knowledge: Difference between revisions
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2nd Level - Process Topic
The section below here is under construction
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! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample | ! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample | ||
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!Techniques | !Techniques | ||
!Materials | !Materials | ||
!Entry page in LabAdviser | |||
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|Soap Sonic | |Soap Sonic | ||
|Removes dust and particles | |Removes dust and particles | ||
|[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]] | |||
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|7-up & Piranha | |7-up & Piranha | ||
|Removes organics and alkali ions | |Removes organics and alkali ions | ||
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|RCA | |RCA | ||
|Two step process to remove organics and metals | |Two step process to remove organics and metals | ||
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|5% HF | |5% HF | ||
|Removes native oxide | |Removes native oxide | ||
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|IMEC | |IMEC | ||
|Removing dust, organics and alkali ions and slightly polish the surface. | |Removing dust, organics and alkali ions and slightly polish the surface. | ||
Make the surface hydrophillic | Make the surface hydrophillic | ||
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!colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x100px|Dry your sample]] Dry your sample | !colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x100px|Dry your sample]] Dry your sample | ||
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!Techniques | !Techniques | ||
!Materials | !Materials | ||
!Entry page in LabAdviser | |||
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|Spin dryers | |Spin dryers | ||
|Whole wafers | |Whole wafers | ||
|[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]] | |||
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|Critial point dryer | |Critial point dryer | ||
|Sensitive wafers | |Sensitive wafers | ||
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Revision as of 13:16, 29 July 2014
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Overview of sample processing 4
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Overview of sample processing 5
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