Specific Process Knowledge: Difference between revisions

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! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample
! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample
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!Entry page in LabAdviser
!Techniques
!Techniques
!Materials
!Materials
!Entry page in LabAdviser
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|[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
|Soap Sonic
|Soap Sonic
|Removes dust and particles
|Removes dust and particles
|[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
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|-
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|7-up & Piranha
|7-up & Piranha
|Removes organics and alkali ions
|Removes organics and alkali ions
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|RCA
|RCA
|Two step process to remove organics and metals
|Two step process to remove organics and metals
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|5% HF
|5% HF
|Removes native oxide
|Removes native oxide
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|IMEC
|IMEC
|Removing dust, organics and alkali ions and slightly polish the surface.  
|Removing dust, organics and alkali ions and slightly polish the surface.  
Make the surface hydrophillic
Make the surface hydrophillic
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!colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x100px|Dry your sample]] Dry your sample
!colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x100px|Dry your sample]] Dry your sample
|-
|-
!Entry page in LabAdviser
!Techniques
!Techniques
!Materials
!Materials
!Entry page in LabAdviser
|-
|-
|[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]]
|Spin dryers
|Spin dryers
|Whole wafers
|Whole wafers
|[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]]
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|-
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|Critial point dryer
|Critial point dryer
|Sensitive wafers
|Sensitive wafers
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|-
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Revision as of 13:16, 29 July 2014

2nd Level - Process Topic

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Overview of sample processing 4

Overview of sample processing 5



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