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Specific Process Knowledge: Difference between revisions

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!Materials
!Materials
|-
|-
|[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD| Thin film deposition/.../Deposition of Silicon Oxide using PECVD
|[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD| Thin film deposition/.../Deposition of Silicon Oxide using PECVD]]
|PECVD
|PECVD
|Deposit SiO2 or Si3N4 doped with P,B and Ge
|Deposit SiO2 or Si3N4 doped with P,B and Ge

Revision as of 13:59, 12 June 2014

2nd Level - Process Topic

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Choose the process topic you are interested in

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Overview of sample processing

Clean the sample File:Cleaning.jpg
Drying Samples File:Drying.jpg
Thermal treatment of the sample File:Thermal treatment 1.jpg
Bonding samples together
Characterize the sample

Overview of sample processing 2

File:Cleaning.jpg
Clean the sample
File:Drying.jpg
Drying Samples
File:Thermal treatment 1.jpg
Thermal treatment of the sample
Bonding samples together
Characterize the sample

Overview of sample processing 3

Clean your sample
Drying your Samples
Thermal treatment of your sample
Bonding your samples together
Characterize your sample