Specific Process Knowledge/Lithography: Difference between revisions
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*UV sensitive: | *UV sensitive: | ||
** | **AZ 5214E, AZ 4562 | ||
**AZ MiR 701, AZ nLOF 2020 | **AZ MiR 701, AZ nLOF 2020 | ||
**SU-8 | **SU-8 | ||
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*DUV sensitive | *DUV sensitive | ||
** | **JSR KRF M230Y | ||
** | **JSR KRF M35G | ||
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*E-beam sensitive | *E-beam sensitive | ||
** | **ZEP 502A, CSAR, PMMA (positive) | ||
**HSQ, Ma-N 2403, AR-N 7520 (negative) | **HSQ, Ma-N 2403, AR-N 7520 (negative) | ||
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