Specific Process Knowledge/Lithography: Difference between revisions
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In order to realize your device you will need a way to draw the patterns that define the structures in the different layers on the wafer. | In order to realize your device you will need a way to draw the patterns that define the structures in the different layers on the wafer. | ||
This is done in a drawing tool for mask layout. The output is a file you send to a mask house, which in return supplies you with a number of photolithographic masks. Each mask is a glass plate with a chromium pattern that mimics a layer in your layout. | This is done in a drawing tool for mask layout. The output is a file you send to a mask house, which in return supplies you with a number of photolithographic masks. Each mask is a glass plate with a chromium pattern that mimics a layer in your layout. | ||
[[/Mask Design|Mask Design]] | Please read more details here: [[/Mask Design|Mask Design]] | ||
=Comparing lithography methods at DTU Danchip= | =Comparing lithography methods at DTU Danchip= | ||