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Specific Process Knowledge/Lithography: Difference between revisions

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*E-beam sensitive
*E-beam sensitive
**ZEP502A (positive)
**ZEP502A, CSAR, PMMA (positive)
**CSAR (positive)
**HSQ, Ma-N 2403, AR-N 7520 (negative)
**PMMA (positive)
**HSQ (negative)
**Ma-N 2403 (negative)
**AR-N 7520 (negative)
 
 
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*Imprint polymers:
*Imprint polymers:
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