Specific Process Knowledge/Lithography: Difference between revisions
| Line 61: | Line 61: | ||
*E-beam sensitive | *E-beam sensitive | ||
**ZEP502A (positive) | **ZEP502A (positive) | ||
**CSAR (positive) | |||
**PMMA (positive) | |||
**HSQ (negative) | **HSQ (negative) | ||
** | **Ma-N 2403 (negative) | ||
**AR-N 7520 (negative) | |||
| | | | ||
*Imprint polymers: | *Imprint polymers: | ||