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Specific Process Knowledge/Lithography/UVlithographyProcessPages: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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'''[[Specific_Process_Knowledge/Lithography/UVLithography#Getting_started|Getting started with UV lithography]]'''
'''[[Specific_Process_Knowledge/Lithography/UVLithography|Getting started with UV lithography]]'''


'''[[Specific Process Knowledge/Lithography/Resist|Resist]]'''
'''[[Specific Process Knowledge/Lithography/Resist|Resist]]'''

Revision as of 10:51, 12 January 2026

Pre-lithography


Getting started with UV lithography

Resist

Substrate Pre-treatment

Coating


Automatic spin coating

Manual spin coating

Spray coating

Soft & hard baking

Exposure


UV Exposure Tools

Deep-UV Exposure

Electron Beam Exposure

Nano Imprint Lithography

Development


Manual development

SU-8 development

Semi-automatic puddle development

Automatic puddle development

Post-lithography


Descum

Lift-off

Strip


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