Specific Process Knowledge/Lithography: Difference between revisions

@@ Line 59: / Line 59: @@
 |
 Process dependent:
-*Dose, <math>Q</math> [µC/cm<sup>2</sup>]
+*Dose [µC/cm<sup>2</sup>]: <math>Q</math>
-*Beam current, <math>I</math> [A]
+*Beam current [A]: <math>I</math>
-*Pattern area, <math>a</math> [cm<sup>2</sup>]
+*Pattern area [cm<sup>2</sup>]: <math>a</math>
-Process time <math>t = \frac{Q \sdot a}{I}</math>
+Process time [s]: <math>t = \frac{Q \sdot a}{I}</math>
 | Process dependent, including heating/cooling rates
 |-