Specific Process Knowledge/Lithography: Difference between revisions
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=Lithography= | |||
[[Image:DUV_wafers.jpg|500px|frameless|right|]] | [[Image:DUV_wafers.jpg|500px|frameless|right|]] | ||
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Lithography is a method used for transferring a pattern from a physical or digital mask onto the substrate. At DTU Nanolab we have four different types of lithography availalbe: | |||
*[[Specific Process Knowledge/Lithography/UVLithography|UV Lithography]] | *[[Specific Process Knowledge/Lithography/UVLithography|UV Lithography]]: UV lithography is used for making features as small as about 1 micrometer | ||
*[[Specific Process Knowledge/Lithography/DUVStepperLithography|DUV Stepper Lithography]] | *[[Specific Process Knowledge/Lithography/DUVStepperLithography|DUV Stepper Lithography]]: DUV lithography is used for features as small as 100-200 nm | ||
*[[Specific Process Knowledge/Lithography/EBeamLithography|E-beam Lithography]] | *[[Specific Process Knowledge/Lithography/EBeamLithography|E-beam Lithography]]: The smallest features can be made in our e-beam writers - about 10 nm | ||
*[[Specific_Process_Knowledge/Imprinting|Nano Imprint Lithography]] | *[[Specific_Process_Knowledge/Imprinting|Nano Imprint Lithography]]: for stamping without irradiation | ||
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=Comparing lithography methods at DTU Nanolab= | =Comparing lithography methods at DTU Nanolab= | ||