Specific Process Knowledge/Lithography/Strip: Difference between revisions
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===Process Information=== | ===Process Information=== | ||
Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Process_gas_ratio_for_plasma_asher_4_&_5|here]]. | Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Process_gas_ratio_for_plasma_asher_4_&_5|here]]. | ||
'''Other processes specfic for plasma asher 5:'''<br> | '''Other processes specfic for plasma asher 5:'''<br> | ||