Specific Process Knowledge/Lithography/Strip: Difference between revisions
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=Plasma Asher 4= | =Plasma Asher 4= | ||
[[File:PA5 front.jpg|320px|thumb|Plasma asher 4 in cleanroom E-5.|right]] | [[File:PA5 front.jpg|320px|thumb|Plasma asher 4 in cleanroom E-5.|right]] | ||
Product name: PVA Tepla Gigabatch 380M<br> | |||
Year of purchase: 2024 | |||
The Plasma Asher 4 can be used for the following processes: | The Plasma Asher 4 can be used for the following processes: | ||
*Photoresist stripping | *Photoresist stripping | ||