Specific Process Knowledge/Lithography/Strip: Difference between revisions
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=Plasma Asher 3: Descum= | =Plasma Asher 3: Descum= | ||
[[image:2017-03-15 13.12.45.jpg|350x350px|thumb|Plasma Asher 3: Descum is placed A-5]] | [[image:2017-03-15 13.12.45.jpg|350x350px|thumb|Plasma Asher 3: Descum is placed A-5]] | ||
Product name: Diener Pico Plasma Asher<br> | |||
Year of purchase: 2014 | |||
The Plasma Asher 3: Descum is dedicated for resist descum, i.e. removal of remains resist traces after development. It has a small chamber, so you can only load a single 100 mm substrate, or a few smaller pieces. | The Plasma Asher 3: Descum is dedicated for resist descum, i.e. removal of remains resist traces after development. It has a small chamber, so you can only load a single 100 mm substrate, or a few smaller pieces. | ||