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Specific Process Knowledge/Lithography/Strip: Difference between revisions

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*Film or pattern of all but Type IV
*Film or pattern of all but Type IV
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*<b>No metals allowed - including metal oxides</b><br>
*<b>No metals</b><br>
*<b>No metal oxides</b><br>
*Silicon, glass, and polymer substrates
*Silicon, glass, and polymer substrates
*Film or pattern of photoresist/polymer
*Film or pattern of photoresist/polymer