Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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* Thin layers (up to 200-300 nm) | * Thin layers (up to 200-300 nm) | ||
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* Thin layers (up to | * Thin layers (up to 200 nm)* | ||
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*1,5-2 nm after 10 min. | *1,5-2 nm after 10 min. | ||