Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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In order to execute the pattern writing a significant number of parameters must be defined for the job. These are defined in two text files; the Schedule File (SDF) and Jobdeck File (JDF). The system has a close to zero tolerance on syntax error from the user and thus these files should be prepared carefully, usually by using templates and correcting the parameters to suit the exposure. We encourage users to [https://www.wolosoft.com/en/superedi/ download and use SuperEdi] for editing SDJ/JDF files. As the JEOL 9500 is operated from a Unix computer you must save your SDF/JDF files in Unix format, available as an option from the “Save As” menu in SuperEdi. | In order to execute the pattern writing a significant number of parameters must be defined for the job. These are defined in two text files; the Schedule File (SDF) and Jobdeck File (JDF). The system has a close to zero tolerance on syntax error from the user and thus these files should be prepared carefully, usually by using templates and correcting the parameters to suit the exposure. We encourage users to [https://www.wolosoft.com/en/superedi/ download and use SuperEdi] for editing SDJ/JDF files. As the JEOL 9500 is operated from a Unix computer you must save your SDF/JDF files in Unix format, available as an option from the “Save As” menu in SuperEdi. | ||
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The bottom right corner of SuperEdi must say '''UNIX''' for the JEOL 9500 computer to interpret the file correctly at compilation. | |||
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The SDF is the governing job descriptor. It defines which cassette to use for exposure, which slot of that cassette to expose, which beam current to expose with and the base dose of the exposure. The SDF will reference the JDF with further job information such as which pattern to write and where to write the pattern. The JDF will in turn reference a (or set of) V30 pattern files that hold the pattern(s) to write. | The SDF is the governing job descriptor. It defines which cassette to use for exposure, which slot of that cassette to expose, which beam current to expose with and the base dose of the exposure. The SDF will reference the JDF with further job information such as which pattern to write and where to write the pattern. The JDF will in turn reference a (or set of) V30 pattern files that hold the pattern(s) to write. | ||