LabAdviser

LabAdviser is a process handbook for equipment and processes at the DTU Danchip cleanroom facilities. The function and capacity of each piece of equipment is described in detail and general process steps, eg photolithography procedures, are clarified. LabAdviser is meant to advise you to a good starting point for your cleanroom process for further optimization to meet your needs. To enter LabAdviser you need to log in with your DTU login. LabAdviser is only editable for Danchip employees. If you need further information about certain machinery or processes, please contact the Danchip personnel. Any feedback you might have on LabAdviser is welcome and can be given by mail to the LabAdviser mailbox: labadviser@danchip.dtu.dk

News in LabAdviser:
The latest monthly LabAdviser update: LabAdviser update send out 2014-11-25
Slides from the customer meeting December 2013: Customer meeting 2013

Contents

• Danchip contact information
• Introduction to LabAdviser and Processing
• Introduction to LabManager
• Process flow approval
• Specific Process Knowledge
• Equipment List
• New equipment in the pipeline and old equipment for decommissioning
• Surveys, statistics, monthly LabAdviser updates and other info.
• How to add information to LabAdviser

• Overview of processing steps, how can you process your sample at DTU Danchip and a guide to where you can find the information in LabAdviser

Front Image - - - Clean your sample Dry your sample Create a thin film on your sample Dope your sample Thermal treatment of your sample Make a mask on your sample Transfer pattern to your sample Define your structure directly File:Jehandefine.jpg Bond your samples together Characterize your sample Pack your sample	[[|right|500x500px]]	Clean your sample Clean your sample Entry page in LabAdviser Techniques Materials Wafer cleaning Soap Sonic Removes dust and particles 7-up & Piranha Removes traces of organics and alkali ions RCA Two step process to remove traces of organics and metals 5% HF Removes native oxide IMEC Removing dust, traces of organics and alkali ions and slightly polish the surface. Make the surface hydrophillic Dry your sample Dry your sample Entry page in LabAdviser Techniques Materials Wafer and sample drying Spin dryers Whole wafers Critial point dryer Sensitive wafers Ethanol fume drying Sensitive wafers N2 blow drying N2 pistols Create a layer/film on your sample Create a layer/film on your sample Entry page in LabAdviser Techniques Materials Thermal Process/Oxidation Thermal oxidation Thermal SiO2 Thin film deposition Sputter deposition Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru Semiconductors: Si, Ge, ZnO Oxides: SiO2, ITO, TiO2, Al2O3, MgO, Ta2O5 Cr2O3 Transparent Conducting Oxides: ITO, AZO Alloys: TiW, NiCr, AlTi, NiV, AlCu, CoFe, CuTi, FeMn, MnIr, NiCo, NiFe, YSZ Thermal evaporation Al, Ge, Ag E-beam evaporation Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Pd, Ag, Cu, W, Ta Semiconductors: Si, Ge Oxides: SiO2, TiO2 Alloys: NiCr, TiAl LPCVD Si3N4, SRN, SiO2, Si (poly and amorph) PECVD Si3N4, SiO2, PBSG Electroplating Ni Epitaxial growth /MOCVD Al, As, Ga, In, P. doping: Si, Zn Lithography/Coaters Spin coating resists, polymers Spray coating resists, polymers Dope your sample Dope your sample Entry page in LabAdviser Techniques Materials Doping Ion implant e.g. P, B, As PECVD Deposition of SiO2 or Si3N4 doped with P,B and Ge LPCVD Deposition of PolySi doped with B or P Predeposition and drive-in Doping Silicon wafers with boron Predeposition and drive-in Doping Silicon wafers with phosphorus Thermal treatment of your sample Thermal treatment of your sample Entry page in LabAdviser Techniques Materials Thermal Process Annealing (>350C) Si, PECVD layers, Al, BCB curing, Polymer Oxidation Si wafers Doping with B/P Si wafers Pyrolysis Resists: AZ, SU8, PDMS Rapid Thermal Anneal (RTP) SiO2, Si3N4, Ti, III-V Lithography/Baking Baking (<300dg) baking resist and polymers Make a mask on your sample Make a mask on your sample Entry page in LabAdviser Techniques Materials Lithography Pattern design Photolithography UV resists Deep UV lithography DUV resists E-beam lithography E-beam resists Imprinting Polymers Transfer mask pattern to your sample Transfer mask pattern to your sample Entry page in LabAdviser Techniques Materials Etch Wet etch Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs Dry etch Any material Lithography/Lift-off Lift-off Most materials Define your structure directly Entry page in LabAdviser Techniques Materials Direct Structure Definition Polymer Injection molding Topas, PP, PE, PS LASER micro machining Silicon, Metal, Graphene (on silicon), Glass (Pyrex, fused silica), TOPAS, PMMA Dicing saw Silicon, Glass (Pyrex, fused silica) Imprinting TOPAS, PMMA Lithography definition SU8, AZ resists Bond your samples together Bond your samples together Entry page in LabAdviser Techniques Bonding Eutectic bonding Fusion bonding Anodic bonding Etch/DryEtchProcessing/Bonding Temporary bonding of wafers or chips for dry etching Characterize your sample Characterize your sample Entry page in LabAdviser What do you need to measure? Technique/Method Characterization Sample Imaging, XY dimensions Microscopy: optical, SEM, AFM Sample Topography AFM, Profiling with stylus or optical Film thickness and optical constants Ellipsometry, Reflectometry, Prism Coupling Film Stress Profiling with stylus or optical Wafer thickness Micrometer gauge Element analysis XPS, EDX, SIMS Contact Angle Drop shape analyzing Resistivity Four point probe, Probe station Doping level/Carrier density ECV (Electrochemical Capacitance-Voltage) -profiler Direct Bandgap Photoluminescence Lattice mismatch X-ray diffractometer Defects/contamination Particle/defect counter Pack your sample (back-end) Pack your sample (back-end) Entry page in LabAdviser Techniques Back-end processing Chip/die mounting Wire bonding Dicing

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Cleanroom naming and phone numbers

Room number Where in the room Phone number A-1 At III-V RIE 55 804 Ax2 At the Lesker 55 815 A-5 In the corner near the furnace/plasma asher 55 803 B-1 In the corridor 55 806 C-1 At the corridor 55 808 D-1 The entrance room 55 703 D-3 At the KOH 55 940 E-1 By the thin client 55 943 E-5 By Inclined UV-lamp 55 946 E-6 Furnace 6" 55 948 F-1 III-V growth 55 949 F-2 Opposite SEM Zeiss 55 941 F-3 DUV Stepper 55 947 SIMS/XPS room in the basement ? 55 813 Injection molder room in the basement ? 55 812