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| Line 681: |
Line 681: |
| ! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample | | ! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample |
| |- | | |- |
| !Entry page in LabAdviser
| |
| !Techniques | | !Techniques |
| !Materials | | !Materials |
| | !Entry page in LabAdviser |
| |- | | |- |
| |[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
| |
| |Soap Sonic | | |Soap Sonic |
| |Removes dust and particles | | |Removes dust and particles |
| | |[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]] |
| |- | | |- |
| |
| |
| |7-up & Piranha | | |7-up & Piranha |
| |Removes organics and alkali ions | | |Removes organics and alkali ions |
| | | |
| |- | | |- |
| |
| |
| |RCA | | |RCA |
| |Two step process to remove organics and metals | | |Two step process to remove organics and metals |
| | | |
| |- | | |- |
| |
| |
| |5% HF | | |5% HF |
| |Removes native oxide | | |Removes native oxide |
| | | |
| |- | | |- |
| |
| |
| |IMEC | | |IMEC |
| |Removing dust, organics and alkali ions and slightly polish the surface. | | |Removing dust, organics and alkali ions and slightly polish the surface. |
| Make the surface hydrophillic | | Make the surface hydrophillic |
| | | |
| |- | | |- |
| |} | | |} |
| Line 711: |
Line 711: |
| !colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x100px|Dry your sample]] Dry your sample | | !colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x100px|Dry your sample]] Dry your sample |
| |- | | |- |
| !Entry page in LabAdviser
| |
| !Techniques | | !Techniques |
| !Materials | | !Materials |
| | !Entry page in LabAdviser |
| |- | | |- |
| |[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]]
| |
| |Spin dryers | | |Spin dryers |
| |Whole wafers | | |Whole wafers |
| | |[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]] |
| |- | | |- |
| |
| |
| |Critial point dryer | | |Critial point dryer |
| |Sensitive wafers | | |Sensitive wafers |
| | | |
| |- | | |- |
| |} | | |} |
2nd Level - Process Topic
Feedback to this page: click here
Choose the process topic you are interested in
The section below here is under construction 
Overview of sample processing 4
| Clean your sample Clean your sample
|
| Entry page in LabAdviser
|
Techniques
|
Materials
|
| Wafer cleaning
|
Soap Sonic
|
Removes dust and particles
|
|
|
7-up & Piranha
|
Removes organics and alkali ions
|
|
|
RCA
|
Two step process to remove organics and metals
|
|
|
5% HF
|
Removes native oxide
|
|
|
IMEC
|
Removing dust, organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
|
|
|
| Create a layer/film on your sample Create a layer/film on your sample
|
| Entry page in LabAdviser
|
Techniques
|
Materials
|
| Thermal Process/Oxidation
|
Thermal oxidation
|
Thermal SiO2
|
| Thin film deposition
|
|
|
|
|
Sputter deposition
|
Si,SiO2,Si3N3,TiO2, metals
|
|
|
Thermal evaporation
|
Al, ?
|
|
|
E-beam evaporation
|
Metals
|
|
|
LPCVD
|
Si3N4, SRN, SiO2, Si (poly and amorph)
|
|
|
PECVD
|
Si3N4, SiO2, PBSG
|
|
|
Electroplating
|
Ni
|
|
|
Epitaxial growth /MOCVD
|
?
|
| Lithography/Coaters
|
|
|
|
|
Spin coating
|
resists, polymers
|
|
|
Spray coating
|
resists, polymers
|
|
|
|
|
|
| Transfer mask pattern to your sample Transfer mask pattern to your sample
|
| Entry page in LabAdviser
|
Techniques
|
Materials
|
| Etch
|
|
|
|
|
Wet etch
|
Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
|
|
|
Dry etch
|
Any material
|
| Lithography/Lift-off
|
|
?
|
|
|
|
| Characterize your sample Characterize your sample
|
| Entry page in LabAdviser
|
What do you need to measure?
|
Technique/Method
|
| Characterization
|
Sample Imaging, XY dimensions
|
Microscopy: optical,SEM,AFM
|
|
|
Sample Topography
|
AFM,Profiling with stylus or optical
|
|
|
Film thickness and optical constants
|
Ellipsometry,Reflectometry,Prism Coupling
|
|
|
Film Stress
|
Profiling with stylus or optical
|
|
|
Wafer thickness
|
|
|
|
Element analysis
|
XPS,EDX,SIMS
|
|
|
Contact Angle
|
|
|
|
Resistivity
|
Four point probe
|
|
|
Doping level/Carrier density
|
|
|
|
Photoluminescence
|
|
|
|
|
Overview of sample processing 5
| Clean your sample Clean your sample
|
| Techniques
|
Materials
|
Entry page in LabAdviser
|
| Soap Sonic
|
Removes dust and particles
|
Wafer cleaning
|
| 7-up & Piranha
|
Removes organics and alkali ions
|
|
| RCA
|
Two step process to remove organics and metals
|
|
| 5% HF
|
Removes native oxide
|
|
| IMEC
|
Removing dust, organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
|
|
|
|
| Create a layer/film on your sample Create a layer/film on your sample
|
| Entry page in LabAdviser
|
Techniques
|
Materials
|
| Thermal Process/Oxidation
|
Thermal oxidation
|
Thermal SiO2
|
| Thin film deposition
|
|
|
|
|
Sputter deposition
|
Si,SiO2,Si3N3,TiO2, metals
|
|
|
Thermal evaporation
|
Al, ?
|
|
|
E-beam evaporation
|
Metals
|
|
|
LPCVD
|
Si3N4, SRN, SiO2, Si (poly and amorph)
|
|
|
PECVD
|
Si3N4, SiO2, PBSG
|
|
|
Electroplating
|
Ni
|
|
|
Epitaxial growth /MOCVD
|
?
|
| Lithography/Coaters
|
|
|
|
|
Spin coating
|
resists, polymers
|
|
|
Spray coating
|
resists, polymers
|
|
|
|
|
|
| Transfer mask pattern to your sample Transfer mask pattern to your sample
|
| Entry page in LabAdviser
|
Techniques
|
Materials
|
| Etch
|
|
|
|
|
Wet etch
|
Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
|
|
|
Dry etch
|
Any material
|
| Lithography/Lift-off
|
|
?
|
|
|
|
| Characterize your sample Characterize your sample
|
| Entry page in LabAdviser
|
What do you need to measure?
|
Technique/Method
|
| Characterization
|
Sample Imaging, XY dimensions
|
Microscopy: optical,SEM,AFM
|
|
|
Sample Topography
|
AFM,Profiling with stylus or optical
|
|
|
Film thickness and optical constants
|
Ellipsometry,Reflectometry,Prism Coupling
|
|
|
Film Stress
|
Profiling with stylus or optical
|
|
|
Wafer thickness
|
|
|
|
Element analysis
|
XPS,EDX,SIMS
|
|
|
Contact Angle
|
|
|
|
Resistivity
|
Four point probe
|
|
|
Doping level/Carrier density
|
|
|
|
Photoluminescence
|
|
|
|
|
jmli test