Jump to content
Main menu
Main menu
move to sidebar
hide
General
Home
Safety
LabManager
Training Videos
Characterization (B314/307)
Layout and Phones (B314/307)
Safety
Preparation
Microscopy
Fabrication & Characterization (B346/347)
Layout and Phones (B346/347)
Getting Started
Process Flow
Tool Package Training (TPT)
Process Information
Back-end Processing
Bonding
Characterization
Doping
Etching
Lithography
Pattern Design
Polymer Processing
Thermal Processing
Thin Film Deposition
Wafer Cleaning
Wafer Drying
Additional Information
Wafer Information
Cleanroom Chemicals
Fume Hoods
Contact
Administration
Contact Information
LabAdviser Mailbox
Fabrication Support
Microscopy Support
Editor Pages
Recent changes
Sidebar Access
Editor Rules (LabIntra)
Help
Search
Search
Appearance
Log in
Personal tools
Log in
Specific Process Knowledge/Lithography: Difference between revisions
Page
Discussion
English
Read
View source
View history
Tools
Tools
move to sidebar
hide
Actions
Read
View source
View history
General
What links here
Related changes
Special pages
Page information
Appearance
move to sidebar
hide
Help
← Older edit
Newer edit →
Visual
Wikitext
Revision as of 07:56, 12 June 2014
view source
Taran
(
talk
|
contribs
)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528
edits
→
Comparing lithography methods at DTU Danchip
← Older edit
Revision as of 07:56, 12 June 2014
view source
Taran
(
talk
|
contribs
)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528
edits
→
Comparing lithography methods at DTU Danchip
Newer edit →
Line 84:
Line 84:
~ 100nm to 2µm
~ 100nm to 2µm
|
|
droplet
droplet
|-
|-
