Specific Process Knowledge/Lithography: Difference between revisions

@@ Line 172: / Line 172: @@
 |-
-| style="width: 45%; align="top"
+| style="width: 30%"|
 ==[[Specific Process Knowledge/Lithography/UVLithography|UV Lithography]]==
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 *[[Specific Process Knowledge/Lithography/UVExposure#EVG Aligner|EVG Aligner]]
 *[[Specific Process Knowledge/Lithography/UVExposure#III-V Aligner|III-V Aligner]]
+| style="width: 30%"|
 ===[[Specific Process Knowledge/Lithography/Baking|Baking]]===
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 ===[[Specific Process Knowledge/Lithography/WaferCleaning|Wafer Cleaning]]===
-| style="width: 45%;"|
+| style="width: 30%;"|
 ==[[Specific Process Knowledge/Lithography/DUVStepperLithography|DUV Stepper Lithography]]==
 *[[Specific Process Knowledge/Lithography/DUVStepper#GammaSpinner|Gamma Spinner]]