Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions

@@ Line 1: / Line 1: @@
+{{cc-nanolab}}
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD  click here]''' <br>
-[[Category: Equipment|Thin film PECVD]]
+[[Category:Equipment|Thin film PECVD]]
-[[Category: Thin Film Deposition|PECVD]]
+[[Category:Thin Film Deposition|PECVD]]
-{{CC1}}
 ==PECVD Plasma Enhanced Chemical Vapor Deposition==
@@ Line 29: / Line 30: @@
 *[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]]
-*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]
+*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]<br />
-<br clear="all" />
 ==Overview of the performance of PECVD thin films and some process related parameters==
@@ Line 64: / Line 56: @@
 |style="background:LightGrey; color:black"|Film thickness
 |style="background:WhiteSmoke; color:black"|
-*~10nm - 30µm
+*~10nm - 30µm (recipe dependant)
 |
-*~10nm - 30µm
+*~10nm - 30µm (recipe dependant)
 |-
 |style="background:LightGrey; color:black"|Index of refraction