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Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
- 15:57, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaEbeam (Created page with "==Spin Coater: Gamma E-beam and UV== 400px|right|thumb|Spin Coater: Gamma E-beam & UV in E-5 Spin Coater: Gamma E-beam and UV was installed at DTU Nanolab in June 2017. It is a Gamma 4M cluster from Süss MicroTec with spin coating, HMDS vapour priming, and baking modules. The system handles 2", 4", and 6" wafers without size conversion, using two separate coater stations. The 2" coater station is equipped with 1 resist line,...")
- 15:30, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaUV (Created page with "==Spin Coater: Gamma UV== 400px|right|thumb|Spin Coater: Gamma UV in E-5 '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV click here]''' ''Coater comparison table'' Spin Coater: Gamma UV was insta...")
- 16:17, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/NILresist (Created page with "Here is a table with 2 different imprint resists we have recently used in the cleanroom, with links to a purchase manufactor, technical reports about resist properties and a current process flow, tested in our cleanroom. {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" |- |- |-style="background:silver; color:black" |'''Resist''' |'''Manufacturer''' |'''Comments''' |'''Technical reports''' |'''Thinner''' |'''Spinner''' |'''Rinse''' |'''...")
- 16:12, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/Ebeamresist (Created page with "== Standard E-beam resists and process guidelines == DTU Nanolab offers a limited number of standard EBL resist for our users. Our standard resist and process guidelines are summarized below. CSAR (AR-P 6200.09) is installed on Spin coater Gamma E-beam & UV for easy spin coating of 2", 4" and 6" substrates. Other substrate sizes or resist have to be used in the Labspin 2/3 coating systems. The standard resist bottles are stored in the chemical cupboard in E-4. {|borde...")
- 16:06, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/DUVresist (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist/DUVresist click here]''' ==DUV resist== The spinning process will be performed by the customer together with the Photolith group of Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you. In...")
- 17:10, 25 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/UVresist (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist/UVresist click here]''' '''This section is under construction 70px''' = UV sensitive photoresist = = Exposure dose =")
- 17:07, 25 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist (Created page with "'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist click here]''' Resist Resist =Resist= '''This section is under construction 70px'''")
- 12:26, 24 January 2023 Jehem talk contribs created page File:Lift-off process new.png (Illustration of the lift-off process.)
- 12:26, 24 January 2023 Jehem talk contribs uploaded File:Lift-off process new.png (Illustration of the lift-off process.)
- 11:46, 24 January 2023 Jehem talk contribs created page File:Imprint schematic new.png (Schematic of the hot embossing process.)
- 11:46, 24 January 2023 Jehem talk contribs uploaded File:Imprint schematic new.png (Schematic of the hot embossing process.)
- 10:09, 24 January 2023 Jehem talk contribs created page File:AZ photoresists spectral sensitivity - remake v1.png (Spectral sensitivity of AZ resists represented as optical absorption.)
- 10:09, 24 January 2023 Jehem talk contribs uploaded File:AZ photoresists spectral sensitivity - remake v1.png (Spectral sensitivity of AZ resists represented as optical absorption.)
- 09:46, 24 January 2023 Jehem talk contribs uploaded a new version of File:AZ spectral sensitivity.gif
- 09:44, 24 January 2023 Jehem talk contribs uploaded a new version of File:AZ spectral sensitivity.gif
- 09:40, 24 January 2023 Jehem talk contribs uploaded a new version of File:Hmds new.jpg
- 16:14, 3 April 2020 Jehem talk contribs uploaded File:LeicaINM100.jpg
- 13:25, 26 August 2016 Jehem talk contribs uploaded File:Hmds new.jpg
- 17:34, 25 August 2016 Jehem talk contribs uploaded File:HMDS spintrack.jpg
- 15:29, 12 August 2016 Jehem talk contribs uploaded File:HMDS2.jpg
- 14:55, 12 August 2016 Jehem talk contribs uploaded File:HMDS gammaUV.jpg
- 13:08, 12 August 2016 Jehem talk contribs uploaded File:Benchtop E5.jpg
- 13:08, 12 August 2016 Jehem talk contribs uploaded File:Benchtop C1.jpg
- 13:08, 12 August 2016 Jehem talk contribs uploaded File:Benchtop A5 2.jpg
- 13:05, 12 August 2016 Jehem talk contribs uploaded File:Benchtop A5 1.jpg
- 15:53, 10 September 2013 Jehem talk contribs uploaded a new version of File:Su8 bench.jpg
- 15:50, 10 September 2013 Jehem talk contribs uploaded File:Su8 bench.jpg
- 15:17, 13 June 2013 Jehem talk contribs uploaded File:Spin-rinser-dryer-white.jpg
