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Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
(newest | oldest) View (newer 50 | older 50) (20 | 50 | 100 | 250 | 500)- 13:39, 16 January 2024 Jehem talk contribs created page File:ResistSensitivity UV.png
- 13:39, 16 January 2024 Jehem talk contribs uploaded File:ResistSensitivity UV.png
- 10:32, 31 August 2023 Jehem talk contribs created page Specific Process Knowledge/Back-end processing/Micro transfer printer (Created page with "Test")
- 14:36, 10 May 2023 Jehem talk contribs created page Template:Cc-nanolab (Created page with "This section, including all images and pictures, is created by DTU Nanolab staff unless otherwise stated.")
- 11:45, 19 April 2023 Jehem talk contribs uploaded a new version of File:Speed vs dose newWritehead.png
- 11:44, 19 April 2023 Jehem talk contribs uploaded a new version of File:Speed vs area newWritehead.png
- 09:36, 24 March 2023 Jehem talk contribs created page File:Speed vs area newWritehead.png
- 09:36, 24 March 2023 Jehem talk contribs uploaded File:Speed vs area newWritehead.png
- 09:35, 24 March 2023 Jehem talk contribs created page File:Speed vs dose newWritehead.png
- 09:35, 24 March 2023 Jehem talk contribs uploaded File:Speed vs dose newWritehead.png
- 10:43, 21 February 2023 Jehem talk contribs created page File:Process flow SU-8 MLA - 2023-02.docx
- 10:43, 21 February 2023 Jehem talk contribs uploaded File:Process flow SU-8 MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow SU-8 MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow SU-8 MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow chip on carrier - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow chip on carrier - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow AZ nLOF 2020 MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ nLOF 2020 MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow AZ nLOF 2020 MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ nLOF 2020 MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow AZ MiR 701 MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ MiR 701 MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow AZ MiR 701 MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ MiR 701 MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow AZ 5214E positive MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ 5214E positive MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow AZ 5214E positive MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ 5214E positive MA6 - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs created page File:Process flow AZ 5214E IR MLA - 2023-02.docx
- 10:42, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ 5214E IR MLA - 2023-02.docx
- 10:41, 21 February 2023 Jehem talk contribs created page File:Process flow AZ 5214E IR MA6 - 2023-02.docx
- 10:41, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ 5214E IR MA6 - 2023-02.docx
- 10:41, 21 February 2023 Jehem talk contribs created page File:Process flow AZ 4562 MLA - 2023-02.docx
- 10:41, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ 4562 MLA - 2023-02.docx
- 10:41, 21 February 2023 Jehem talk contribs created page File:Process flow AZ 4562 MA6 - 2023-02.docx
- 10:41, 21 February 2023 Jehem talk contribs uploaded File:Process flow AZ 4562 MA6 - 2023-02.docx
- 13:39, 7 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Pretreatment/Oven 250C (Created page with "=Oven 250C= 300x300px|thumb|Oven 250C for pretreatment in Cx-1 The oven is typically used for dehydration pretreatment, of Si and glass substrates, to promote the resist adhesion. We recommend placing the wafers in a metal carrier in the oven for at least for 4 hours, or overnight, and spin coat resist on them as soon as possible after removing them from the oven. The user manual, and contact information can be found...")
- 14:46, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/UserBottles (Created page with "== User resist bottles in the cleanroom == 150px|right We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the guidelines below. * Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom). * Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol * Bring the bottle to a fumehood inside the cleanroom; clean the...")
- 13:32, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/DUVStepperLithography/DUVStepper (Created page with "==DUV Stepper== 300x300px|right|thumb|DUV Stepper is placed in F-3 '''Feedback to this section''': '''[mailto:labadviser@anolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper_FPA-3000EX4_from_Canon click here]''' The deep-UV stepper FPA-3000EX4 from Canon is an advanced exposure system designed for mass-production of 6 and...")
- 13:31, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography//DUVStepperLithography/DUVStepper (Created page with "==DUV Stepper== 300x300px|right|thumb|DUV Stepper is placed in F-3 '''Feedback to this section''': '''[mailto:labadviser@anolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper_FPA-3000EX4_from_Canon click here]''' The deep-UV stepper FPA-3000EX4 from Canon is an advanced exposure system designed for mass-production of 6 and...")
- 13:26, 3 February 2023 Jehem talk contribs created page File:HMDS priming schematic.png
- 13:26, 3 February 2023 Jehem talk contribs uploaded File:HMDS priming schematic.png
- 13:20, 3 February 2023 Jehem talk contribs uploaded a new version of File:Hmds new.jpg
- 13:40, 2 February 2023 Jehem talk contribs created page File:SU8 spinCurves 2002 2005.png
- 13:40, 2 February 2023 Jehem talk contribs uploaded File:SU8 spinCurves 2002 2005.png
- 12:17, 31 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/TIspray (Created page with "{{:Specific Process Knowledge/Lithography/authors_generic}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/5214E click here]''' Resist AZ 5214E __TOC__ =Resist Description= TI Spray is specifically designed to be used for spray coating, and is a positive UV photoresist with image revers...")
- 12:01, 31 January 2023 Jehem talk contribs uploaded a new version of File:AZ photoresists spectral sensitivity - remake v1.png
- 10:39, 31 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/authors generic (Created page with "''This section is written by DTU Nanolab staff, unless otherwise stated.''")
- 11:52, 30 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Development/DUV developer (Created page with "=Developer: TMAH Stepper = 300x300px|right|thumb|The Developer-TMAH-Stepper is placed in F-3 This developer is dedicated for development of DUV resists. The developer is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with 1 developer line, in our case 2,38% TMAH in water (AZ 726 MIF), 1 topside rinse line with water, 1 backside rinse line with water and 1 N2 line f...")
- 11:28, 30 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma DUV processing (Created page with "=General Process Information= Processing using Spin Coater: Süss stepper is divided into two parts: *Spin coating *Soft baking ==Spin coating== The process of spin coating on Spin Coater: GSüss stepper consists of a selection of the following steps: *Acceleration to a low spin speed if dynamic dispense is used *Resist dispense *Spin-off The wafer is first centered on the spindle chuck and held in place by vacuum. If static dispense is specified in the process, the sp...")