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Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions

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==Overview of the performance of the phosphorus drive-in furnace and some process related parameters==
==Overview of the performance of the phosphorus drive-in furnace and some process related parameters==


{| border="2" cellspacing="0" cellpadding="10"  
{| border="2" cellspacing="0" cellpadding="0"  
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!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="center"|Purpose  
|style="background:LightGrey; color:black"|Drive-in of phosphor, oxidation of silicon and annealing of the oxide.
|style="background:LightGrey; color:black"|Drive-in of phosphor, oxidation of silicon and annealing of the oxide.
|style="background:WhiteSmoke; color:black"|Oxidation:
|style="background:WhiteSmoke; color:black"|Oxidation:
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*Wet: with torch (H<sub>2</sub>+O<sub>2</sub>)
*Wet: with torch (H<sub>2</sub>+O<sub>2</sub>)
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!style="background:silver; color:black" align="left"|Performance
!style="background:silver; color:black" align="center"|Performance
|style="background:LightGrey; color:black"|Film thickness
|style="background:LightGrey; color:black"|Film thickness
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Dry SiO<sub>2</sub>: 50Å to ~2000Å (takes too long to make it thicker)
*Dry SiO<sub>2</sub>: 50 Å to ~2000 Å (takes too long to make it thicker)
*Wet SiO<sub>2</sub>: 50Å to ~3µm ((takes too long to make it thicker)
*Wet SiO<sub>2</sub>: 50 Å to ~3 µm ((takes too long to make it thicker)
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!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Process parameter range
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
|style="background:LightGrey; color:black"|Process Temperature
|style="background:LightGrey; color:black"|Process Temperature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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*O<sub>2</sub>, N<sub>2</sub> and H<sub>2</sub>
*O<sub>2</sub>, N<sub>2</sub> and H<sub>2</sub>
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|