|
|
| Line 1: |
Line 1: |
| {{cc-nanolab}} | | {{cc-nanolab}} |
|
| |
| '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/UVExposure click here]'''
| |
|
| |
|
| [[Category: Equipment|Lithography exposure]] | | [[Category: Equipment|Lithography exposure]] |
| Line 9: |
Line 7: |
|
| |
|
| =UV Exposure Comparison Table= | | =UV Exposure Comparison Table= |
| | | {| class="wikitable" |
| | | |- |
| {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | | ! |
| | | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]] |
| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]</b>
| |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]</b>
| |
| | |
| |- | | |- |
| !style="background:silver; width:100px; color:black;" align="center"|Purpose | | ! scope=row| Purpose |
| |style="background:LightGrey; color:black"|
| | | |
| |style="background:WhiteSmoke; color:black"|
| | *Top side alignment |
| *Top Side Alignment | | *Back side alignment |
| *Back Side Alignment | |
| *UV exposure | | *UV exposure |
| OBS: this tool is in PolyFabLab
| | NB: this tool is in PolyFabLab |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Back Side Alignment | | *Back side alignment |
| *UV exposure | | *UV exposure |
| *(DUV exposure)
| |
| *Bond alignment | | *Bond alignment |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Back Side Alignment | | *Back side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Back Side Alignment | | *Back side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| *Direct laser writing | | *Direct laser writing |
| OBS: this tool is in PolyFabLab
| | NB: this tool is in PolyFabLab |
| | |
| |- | | |- |
| !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Performance | | ! scope=row| Minimum feature size |
| |style="background:LightGrey; color:black"|Minimum feature size
| | | ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| | |
| |- | | |- |
| |style="background:LightGrey; color:black"|Alignment accuracy
| | ! scope=row| Alignment accuracy |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *TSA: ±2 µm | | *TSA: ±2 µm |
| *BSA: ±5 µm | | *BSA: ±5 µm |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *TSA: ±1 µm | | *TSA: ±1 µm |
| *BSA: ±2 µm | | *BSA: ±2 µm |
| |style="background:WhiteSmoke; color:black"|
| | | |
| ±2 µm<br>(±1 µm possible) | | ±2 µm<br>(±1 µm possible) |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *TSA: ± 0.5 µm | | *TSA: ± 0.5 µm |
| *BSA: ± 1 µm | | *BSA: ± 1 µm |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *TSA: ± 0.5 µm | | *TSA: ± 0.5 µm |
| *BSA: ± 1 µm | | *BSA: ± 1 µm |
| |style="background:WhiteSmoke; color:black"|
| | | |
| ±1 µm | | ±1 µm |
|
| |
| |- | | |- |
| |style="background:LightGrey; color:black"|Exposure light
| | ! scope=row| Exposure light source |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *350W Hg lamp | | *350 W Hg lamp |
| *i-line filter (365nm bandpass filter) | | *i-line filter (365nm band pass filter) |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *500W Hg-Xe lamp | | *500 W Hg-Xe lamp |
| *i-line filter (365nm bandpass filter) | | *i-line filter (365nm band pass filter) |
| |style="background:WhiteSmoke; color:black"|
| | | |
| 365nm LED
| | 365 nm LED |
| |style="background:WhiteSmoke; color:black"|
| | | |
| 375nm laser diode array
| | 375 nm laser diode array |
| |style="background:WhiteSmoke; color:black"|
| | | |
| 405nm laser diode array
| | 405 nm laser diode array |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *365nm LED | | *365 nm LED |
| *405nm laser diode | | *405 nm laser diode |
| | |
| |- | | |- |
| |style="background:LightGrey; color:black"|Exposure mode
| | ! scope=row| Exposure mode |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Flood exposure | | *Flood exposure |
| *Proximity | | *Proximity |
| Line 114: |
Line 91: |
| **Hard contact | | **Hard contact |
| **Vacuum contact | | **Vacuum contact |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Flood exposure | | *Flood exposure |
| *Proximity | | *Proximity |
| Line 121: |
Line 98: |
| **Hard contact | | **Hard contact |
| **Vacuum contact | | **Vacuum contact |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Projection: | | *Projection: |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Projection: | | *Projection: |
| **Optical auto-focus | | **Optical auto-focus |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Projection: | | *Projection: |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Projection: | | *Projection: |
| **Optical auto-focus | | **Optical auto-focus |
| Line 138: |
Line 115: |
| **Optical auto-focus | | **Optical auto-focus |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
|
| |
| |- | | |- |
| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | | ! scope=row| Batch size |
| |style="background:LightGrey; color:black"|Batch size
| | | 1 || 1 || 1 || 1 || 1 || 1 |
| |style="background:WhiteSmoke; color:black"| | |
| *1 100 mm wafer
| |
| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 10x10 mm<sup>2</sup>
| |
| *1 50 mm wafer
| |
| *1 100 mm wafer
| |
| *1 150 mm wafer
| |
| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 5x5 mm<sup>2</sup>
| |
| *1 50 mm wafer
| |
| *1 100 mm wafer
| |
| *1 150 mm wafer (exposure area only 125x125 mm<sup>2</sup>)
| |
| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 3x3 mm<sup>2</sup>
| |
| *1 50 mm wafer
| |
| *1 100 mm wafer
| |
| *1 150 mm wafer
| |
| *1 200 mm wafer
| |
| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 5x5 mm<sup>2</sup>
| |
| *1 50 mm wafer
| |
| *1 100 mm wafer
| |
| *1 150 mm wafer
| |
| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 3x3 mm<sup>2</sup>
| |
| *1 50 mm wafer
| |
| *1 100 mm wafer
| |
| *1 150 mm wafer
| |
| | |
| |- | | |- |
| | style="background:LightGrey; color:black"|Allowed materials
| | ! scope=row| Allowed materials |
| |style="background:WhiteSmoke; color:black"| | | | All PolyFabLab materials |
| *All PolyFabLab materials
| | | |
| |style="background:WhiteSmoke; color:black"|
| |
| *All cleanroom materials except copper and steel | | *All cleanroom materials except copper and steel |
| *Dedicated chuck for III-V materials | | *Dedicated chuck for III-V materials |
| |style="background:WhiteSmoke; color:black"| | | | All cleanroom materials |
| *All cleanroom materials
| | | All cleanroom materials |
| |style="background:WhiteSmoke; color:black"| | | | All cleanroom materials |
| *All cleanroom materials
| | | All PolyFabLab materials |
| |style="background:WhiteSmoke; color:black"| | | |- |
| *All cleanroom materials
| |
| |style="background:WhiteSmoke; color:black"| | |
| *All PolyFabLab materials
| |
| |- | |
| |} | | |} |
|
| |
|
The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.
UV Exposure Comparison Table
|
|
Aligner: MA6-1
|
Aligner: MA6-2
|
Aligner: Maskless 01
|
Aligner: Maskless 02
|
Aligner: Maskless 03
|
Aligner: Maskless 04
|
| Purpose
|
- Top side alignment
- Back side alignment
- UV exposure
NB: this tool is in PolyFabLab
|
- Top side alignment
- Back side alignment
- UV exposure
- Bond alignment
|
- Top side alignment
- Maskless UV exposure
|
- Top side alignment
- Back side alignment
- Maskless UV exposure
|
- Top side alignment
- Back side alignment
- Maskless UV exposure
|
- Top side alignment
- Maskless UV exposure
- Direct laser writing
NB: this tool is in PolyFabLab
|
| Minimum feature size
|
~1 µm |
~1 µm |
~1 µm |
~1 µm |
~1 µm |
~1 µm
|
| Alignment accuracy
|
|
|
±2 µm (±1 µm possible)
|
- TSA: ± 0.5 µm
- BSA: ± 1 µm
|
- TSA: ± 0.5 µm
- BSA: ± 1 µm
|
±1 µm
|
| Exposure light source
|
- 350 W Hg lamp
- i-line filter (365nm band pass filter)
|
- 500 W Hg-Xe lamp
- i-line filter (365nm band pass filter)
|
365 nm LED
|
375 nm laser diode array
|
405 nm laser diode array
|
- 365 nm LED
- 405 nm laser diode
|
| Exposure mode
|
- Flood exposure
- Proximity
- Contact:
- Soft contact
- Hard contact
- Vacuum contact
|
- Flood exposure
- Proximity
- Contact:
- Soft contact
- Hard contact
- Vacuum contact
|
|
- Projection:
- Optical auto-focus
- Pneumatic auto-focus
|
|
- Projection:
- Optical auto-focus
- Pneumatic auto-focus
- Direct laser writing:
- Optical auto-focus
- Pneumatic auto-focus
|
| Batch size
|
1 |
1 |
1 |
1 |
1 |
1
|
| Allowed materials
|
All PolyFabLab materials
|
- All cleanroom materials except copper and steel
- Dedicated chuck for III-V materials
|
All cleanroom materials
|
All cleanroom materials
|
All cleanroom materials
|
All PolyFabLab materials
|
Mask vs Maskless aligners
Comparison study between mask aligners and maskless aligners can be found here.
Decommisioned tools
Inclined UV lamp was decommissioned 2023.
Information about decommissioned tool can be found here.