Specific Process Knowledge/Lithography/UVExposure

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

Feedback to this page: click here

UV Exposure Comparison Table

Equipment		Aligner: MA6-1	Aligner: MA6-2	Aligner: Maskless 01	Aligner: Maskless 02	Aligner: Maskless 03	Aligner: Maskless 04
Purpose		Top Side Alignment Back Side Alignment UV exposure OBS: this tool is in PolyFabLab	Top Side Alignment Back Side Alignment UV exposure (DUV exposure) Bond alignment	Top Side Alignment Maskless UV exposure	Top Side Alignment Back Side Alignment Maskless UV exposure	Top Side Alignment Back Side Alignment Maskless UV exposure	Top Side Alignment Maskless UV exposure Direct laser writing OBS: this tool is in PolyFabLab
Performance	Minimum feature size	~1 µm	~1 µm	~1 µm	~1 µm	~1 µm	~1 µm
	Alignment accuracy	TSA: ±2 µm BSA: ±5 µm	TSA: ±1 µm BSA: ±2 µm	±2 µm (±1 µm possible)	TSA: ± 0.5 µm BSA: ± 1 µm	TSA: ± 0.5 µm BSA: ± 1 µm	±1 µm
	Exposure light	350W Hg lamp i-line filter (365nm bandpass filter)	500W Hg-Xe lamp i-line filter (365nm bandpass filter)	365nm LED	375nm laser diode array	405nm laser diode array	365nm LED 405nm laser diode
	Exposure mode	Flood exposure Proximity Contact: Soft contact Hard contact Vacuum contact	Flood exposure Proximity Contact: Soft contact Hard contact Vacuum contact	Projection: Pneumatic auto-focus	Projection: Optical auto-focus Pneumatic auto-focus	Projection: Pneumatic auto-focus	Projection: Optical auto-focus Pneumatic auto-focus Direct laser writing: Optical auto-focus Pneumatic auto-focus
Substrates	Batch size	1 100 mm wafer	1 small sample, down to 10x10 mm2 1 50 mm wafer 1 100 mm wafer 1 150 mm wafer	1 small sample, down to 5x5 mm2 1 50 mm wafer 1 100 mm wafer 1 150 mm wafer (exposure area only 125x125 mm2)	1 small sample, down to 3x3 mm2 1 50 mm wafer 1 100 mm wafer 1 150 mm wafer 1 200 mm wafer	1 small sample, down to 5x5 mm2 1 50 mm wafer 1 100 mm wafer 1 150 mm wafer	1 small sample, down to 3x3 mm2 1 50 mm wafer 1 100 mm wafer 1 150 mm wafer
	Allowed materials	All PolyFabLab materials	All cleanroom materials except copper and steel Dedicated chuck for III-V materials	All cleanroom materials	All cleanroom materials	All cleanroom materials	All PolyFabLab materials

Mask vs Maskless aligners

Comparison study between mask aligners and maskless aligners can be found here.

Decommisioned tools

Inclined UV lamp was decommissioned 2023.

Information about decommissioned tool can be found here.