Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]</b> | ||
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*Direct laser writing | *Direct laser writing | ||
OBS: this tool is in PolyFabLab | OBS: this tool is in PolyFabLab | ||
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~1 µm | ~1 µm | ||
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±1 µm | ±1 µm | ||
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*365nm LED | *365nm LED | ||
*405nm laser diode | *405nm laser diode | ||
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**Optical auto-focus | **Optical auto-focus | ||
**Pneumatic auto-focus | **Pneumatic auto-focus | ||
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*1 100 mm wafer | *1 100 mm wafer | ||
*1 150 mm wafer | *1 150 mm wafer | ||
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*All PolyFabLab materials | *All PolyFabLab materials | ||
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Revision as of 10:10, 25 June 2026
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UV Exposure Comparison Table
| Equipment | Aligner: MA6-1 | Aligner: MA6-2 | Aligner: Maskless 01 | Aligner: Maskless 02 | Aligner: Maskless 03 | Aligner: Maskless 04 | |
|---|---|---|---|---|---|---|---|
| Purpose |
OBS: this tool is in PolyFabLab |
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|
OBS: this tool is in PolyFabLab | |
| Performance | Minimum feature size |
~1 µm |
~1 µm |
~1 µm |
~1 µm |
~1 µm |
~1 µm |
| Alignment accuracy |
|
|
±2 µm |
|
|
±1 µm | |
| Exposure light |
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|
365nm LED |
375nm laser diode array |
405nm laser diode array |
| |
| Exposure mode |
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| |
| Substrates | Batch size |
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| Allowed materials |
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Decommisioned tools
Inclined UV lamp was decommissioned 2023.