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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Performance
|style="background:LightGrey; color:black"|Minimum feature size
|style="background:LightGrey; color:black"|Minimum feature size
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|style="background:LightGrey; color:black"|Exposure light/filters/spectrum
|style="background:LightGrey; color:black"|Alignment accuracy
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*TSA ±2µm
*BSA ±5µm
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*TSA ±1µm
*BSA ±2µm
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~1 µm
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~1 µm
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~1 µm
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~1 µm
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|style="background:LightGrey; color:black"|Exposure light
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*350W Hg lamp
*350W Hg lamp
*i-line filter (365nm bandpass filter)
*i-line filter (365nm bandpass filter)
*303nm filter optional
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*500W Hg-Xe lamp
*500W Hg-Xe lamp
*i-line filter (365nm bandpass filter)<br>Intensity in Constant Intensity mode:<br>11mW/cm<sup>2</sup> @ 365nm
*i-line filter (365nm bandpass filter)
*UV350 optics optional
*(UV250 optics available)
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365nm LED
365nm LED
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375nm laser diodes
375nm laser diode array
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405nm laser diodes
405nm laser diode array
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*365nm LED
*365nm LED
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
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