Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
Appearance
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!style="background:silver; color:black" align="center" valign="center" rowspan=" | !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Performance | ||
|style="background:LightGrey; color:black"|Minimum feature size | |style="background:LightGrey; color:black"|Minimum feature size | ||
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|style="background:LightGrey; color:black"|Exposure light | |style="background:LightGrey; color:black"|Alignment accuracy | ||
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*TSA ±2µm | |||
*BSA ±5µm | |||
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*TSA ±1µm | |||
*BSA ±2µm | |||
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~1 µm | |||
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~1 µm | |||
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~1 µm | |||
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~1 µm | |||
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|style="background:LightGrey; color:black"|Exposure light | |||
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*350W Hg lamp | *350W Hg lamp | ||
*i-line filter (365nm bandpass filter) | *i-line filter (365nm bandpass filter) | ||
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*500W Hg-Xe lamp | *500W Hg-Xe lamp | ||
*i-line filter (365nm bandpass filter | *i-line filter (365nm bandpass filter) | ||
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365nm LED | 365nm LED | ||
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375nm laser | 375nm laser diode array | ||
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405nm laser | 405nm laser diode array | ||
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*365nm LED | *365nm LED | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan=" | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | ||
|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
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