Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 *Back Side Alignment
 *UV exposure
+OBS: this tool is in PolyFabLab
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 *Top Side Alignment
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 *350W Hg lamp
-*i-line filter (365nm notch filter)<br>Intensity in Constant Intensity mode:<br>8mW/cm<sup>2</sup> @ 365nm
+*i-line filter (365nm bandpass filter)
 *303nm filter optional
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 *500W Hg-Xe lamp
-*i-line filter (365nm notch filter)<br>Intensity in Constant Intensity mode:<br>11mW/cm<sup>2</sup> @ 365nm
+*i-line filter (365nm bandpass filter)<br>Intensity in Constant Intensity mode:<br>11mW/cm<sup>2</sup> @ 365nm
 *UV350 optics optional
 *UV250 optics optional
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 |style="background:LightGrey; color:black"|Batch size
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-*1 small sample, down to 10x10 mm<sup>2</sup>
-*1 50 mm wafer
 *1 100 mm wafer
-*1 150 mm wafer
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 *1 small sample, down to 10x10 mm<sup>2</sup>
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 | style="background:LightGrey; color:black"|Allowed materials
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-*All cleanroom materials except copper and steel
+*All PolyFabLab materials
-*Dedicated 2inch chuck for III-V materials
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 *All cleanroom materials except copper and steel